Difference between revisions of "File:DUV-si-170C-1.zip"

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(SEMs of sample after WG etch and PR strip -PE2 2min, 1165 soak 30min, 1165 U/S (high, freq5, int5) 10 min, PE2 2min)
 
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SEMs of sample after WG etch and PR strip  
 
SEMs of sample after WG etch and PR strip  
-PE2 2min, 1165 soak 30min, 1165 U/S (high, freq5, int5) 10 min, PE2 2min
+
  (PE2 2min, 1165 soak 30min, 1165 U/S (high, freq5, int5) 10 min, PE2 2min)

Revision as of 08:52, 17 August 2012

SEMs of sample after WG etch and PR strip

 (PE2 2min, 1165 soak 30min, 1165 U/S (high, freq5, int5) 10 min, PE2 2min)

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current08:50, 17 August 2012 (1.88 MB)Jaredhulme (Talk | contribs)SEMs of sample after WG etch and PR strip -PE2 2min, 1165 soak 30min, 1165 U/S (high, freq5, int5) 10 min, PE2 2min
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