Difference between revisions of "File:DUV-si-170C-1.zip"
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SEMs of sample after WG etch and PR strip | SEMs of sample after WG etch and PR strip | ||
− | (PE2 2min, 1165 soak 30min, 1165 U/S (high, freq5, int5) 10 min, PE2 2min) | + | (PE2 2min, 1165 soak 30min, 1165 U/S (high, freq5, int5) 10 min, PE2 2min) |
Latest revision as of 08:52, 17 August 2012
SEMs of sample after WG etch and PR strip
(PE2 2min, 1165 soak 30min, 1165 U/S (high, freq5, int5) 10 min, PE2 2min)
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current | 08:50, 17 August 2012 | (1.88 MB) | Jaredhulme (Talk | contribs) | SEMs of sample after WG etch and PR strip -PE2 2min, 1165 soak 30min, 1165 U/S (high, freq5, int5) 10 min, PE2 2min |
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