Department of Electrical and
Computer Engineering
Semiconductor
Device Processing
ECE
124B – Winter 2012
Instructor: Dr. Ilan
Ben-Yaacov
Schedule:
Tues/Thurs 9:30 - 10:45am, GIRV 2123
Announcements
2/28/12:
HW5 is posted on the class website.
2/9/12:
HW4 and Final Lab Prelab
Assignment are posted on the class website.
Final Lab Prelab is to be completed
individually by each student (not as a group), groups
may not start working in the lab until everyone in their group has submitted
the pre-lab.
1/31/12:
HW3 is posted on the class website.
1/24/12:
HW2 is posted on the class website.
1/10/12:
Welcome to ECE 124B. HW1 and all handouts are posted on the
class website.
Syllabus
(click here for syllabus in .pdf
format)
Time: Tues/Thurs
9:30 – 10:45am
Place: GIRV
2123
Instructor: Dr.
Ilan Ben-Yaacov, ESB Room
3221D, ext 5295, ilan[at]engineering.ucsb.edu
Office Hours: Tues/Thurs
10:55 – 11:55am
Teaching Assistant: Stephen
Biedrzycki (sbiedrzycki[at]umail.ucsb.edu), lab hours MW 10-12 and TR 12-2.
Lab Supervisor: Bob Hill, Engineering II Room 1141,
ext 4142, bob[at]ece.ucsb.edu
Laboratory Hours: There are no
scheduled hours for the lab work. The UCSB Instructional Cleanroom will be available weekdays from 8am-5pm. For
safety reasons, you will not be permitted to work alone. There will be
equipment demonstration sessions, which are required.
Lab Safety: It
is essential that safety procedures be followed at all times. You will be
working with acids (including HF), bases, and organic solvents that can be
hazardous if not handled properly. You are required to attend a safety
orientation session before you will be permitted to enter the lab. There
are sessions provided by the university, or a series of tapes provided by the
ECE department and Bob Hill.
Required Text: Fundamentals of Semiconductor
Fabrication by G. S.
May and S. M. Sze, published by John Wiley and Sons, 2004, ISBN
0-471-23279-3.
Handouts and class notes will complement the
text. All handouts can be downloaded by clicking on the appropriate link
at the bottom of this website.
Prerequisites: ECE
132 with a grade of C- or better, or equivalent, or consent of the instructor.
Topics to be covered:
Optical Lithography
Thermal Oxidation
Junction Formation
Etching
Thin Film Deposition
Ohmic, Schottky,
and MOS Contact Formation
NMOS Process and Characterization
Course Format: There
will be homework assignments, a midterm, laboratory work, and a final lab
project. Laboratory work will consist of experimenting with various processes
such as lithography, thermal oxidation, and wet etching, and determining
process tolerances. For the final project, you will use the skills you
have developed in the lab to fabricate and characterize a MOS transistor.
Homework, midterm, lab, and final lab project will each contribute 15%, 30%,
15% and 40% to the final grade.
Lab Project 1 – Due Wed, 1/25/12 by 5:00pm
Lab Project 2 – Due Tues, 2/7/12 by 5:00pm
Final Lab PreLab – Due Monday, 2/20/12 by 5:00pm Tuesday, 2/21/12 by 5:00pm
Final Lab Project – Due Wednesday, 3/21/12 by 5:00pm
Homework 1 – Due
Fri, 1/20/12 by 5:00pm
Homework 2 – Due
Fri, 1/27/12 by 5:00pm
Homework 3 – Due
Thurs, 2/9/12 by 5:00pm
Homework 4 – Due
Fri, 2/24/12 by 5:00pm
Homework 5 –
Due Tues, 3/6/12 by 5:00pm
Midterm will be on Thursday, 3/8/12. You will be allowed a calculator and 2 pages
of notes (8.5 by 11 inch, you may write on front and back). Midterm review will be in class on Tuesday
3/6/12.
NMOS Process Solid Solubilities of
Impurities in Silicon
Wafer Scribing
and Cleaning Periodic Table of Elements
HF Safety Tips Lateral Diffusion
Metal Evaporation
– Thermal Evaporator
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