Difference between revisions of "Mesa Etching"
From OptoelectronicsWiki
Line 5: | Line 5: | ||
[[media:MesaEtching.docx|Process follower (Doc)]] | [[media:MesaEtching.docx|Process follower (Doc)]] | ||
− | The mask file is identical to the mesa layer of the [[media: | + | The mask file is identical to the mesa layer of the [[media:TaperTestMask.rar|taper test mask]]. |
Revision as of 14:35, 13 June 2011
Meas Etching: This page outlines our effort to improve the III-V mesa etch.
Processing
The mask file is identical to the mesa layer of the taper test mask.
Data
Work in progress.