Difference between revisions of "Mesa Etching"
From OptoelectronicsWiki
| Line 5: | Line 5: | ||
[[media:MesaEtching.docx|Process follower (Doc)]] | [[media:MesaEtching.docx|Process follower (Doc)]] | ||
| − | The mask file is identical to the mesa layer of the [[media:TaperTestMask. | + | The mask file is identical to the mesa layer of the [[media:TaperTestMask.zip|taper test mask]]. |
Revision as of 14:37, 13 June 2011
Meas Etching: This page outlines our effort to improve the III-V mesa etch.
Processing
The mask file is identical to the mesa layer of the taper test mask.
Data
Work in progress.
