Difference between revisions of "SOI grating definition"
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− | . | + | ==Unfinalized Processes== |
+ | Standad EBL Spin,Bake, Exposure, Develop | ||
+ | |||
+ | Spin AZ4210 (4000rpm, 30sec) | ||
+ | Pre-Exposure Bake (95C, 1min) | ||
+ | |||
+ | Lithography | ||
+ | 30 GCA Stepper / Autostepper | ||
+ | Exposure: 3sec / 1sec (NEEDS CALIBRATION) | ||
+ | Focus Offset: 0 (NEEDS CALIBRATION) | ||
+ | NO POST-EXPOSURE BAKE | ||
+ | Develop (AZ400K 1:4 diluted, 1min) | ||
+ | DI Rinse | ||
+ | |||
+ | Partial deep grating etch | ||
+ | |||
+ | 4210 strip in ISO | ||
+ | |||
+ | Shallow grating etch/Complete deep grating etch. | ||
+ | |||
+ | ZEP Strip (1165) |
Revision as of 18:44, 27 October 2011
Unfinalized Processes
Standad EBL Spin,Bake, Exposure, Develop
Spin AZ4210 (4000rpm, 30sec) Pre-Exposure Bake (95C, 1min)
Lithography 30 GCA Stepper / Autostepper
Exposure: 3sec / 1sec (NEEDS CALIBRATION) Focus Offset: 0 (NEEDS CALIBRATION) NO POST-EXPOSURE BAKE Develop (AZ400K 1:4 diluted, 1min) DI Rinse
Partial deep grating etch
4210 strip in ISO
Shallow grating etch/Complete deep grating etch.
ZEP Strip (1165)