Difference between revisions of "SOI waveguide definition"
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Back to [[Process_Hybrid_Silicon]]. | Back to [[Process_Hybrid_Silicon]]. | ||
==Current Processes== | ==Current Processes== | ||
| − | Process follower - [[Si WG etch]] | + | Single etch depth |
| − | Process flow - [[]] | + | Process follower - [[Si WG etch]]. |
| + | Process flow - [[Si WG etch]]. | ||
| + | ==Suggestions for modified process== | ||
| + | [[Silicon processing.pptx|10282011_HSP]] | ||
Revision as of 07:48, 28 October 2011
Back to Process_Hybrid_Silicon.
Current Processes
Single etch depth Process follower - Si WG etch. Process flow - Si WG etch.
