Difference between revisions of "SOI waveguide definition"
From OptoelectronicsWiki
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==Current Processes== | ==Current Processes== | ||
Single etch depth | Single etch depth | ||
| − | Process follower - [[Si WG etch]] | + | Process follower - [[Si WG etch]] \n |
| − | Process flow - [[Si WG etch]] | + | Process flow - [[Si WG etch]] \n |
==Suggestions for modified process== | ==Suggestions for modified process== | ||
[[Silicon processing.pptx|10282011_HSP]] | [[Silicon processing.pptx|10282011_HSP]] | ||
Revision as of 07:49, 28 October 2011
Back to Process_Hybrid_Silicon.
Current Processes
Single etch depth Process follower - Si WG etch \n Process flow - Si WG etch \n
