Difference between revisions of "UCSB E-Phi Runs"
From OptoelectronicsWiki
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* 01/21 - 01/30 fabrication. | * 01/21 - 01/30 fabrication. | ||
====Components and structures==== | ====Components and structures==== | ||
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===UCSB-E-Phi-dev-2=== | ===UCSB-E-Phi-dev-2=== | ||
| − | III/V lasers and SOAs on SOI; | + | III/V lasers and SOAs on SOI;<br> |
Planning: | Planning: | ||
| − | * | + | * 2.17.2012 Concepts for SOA spin due |
| − | * 02 | + | * 3.02.2012 Fleshed-out designs for mask inclusion |
| + | * 3.16.2012 Designs ready for review (i.e. gds files) | ||
| + | * 3.30.2012 Mask tapeout deadline | ||
| + | * 4.15.2012 Processing begins | ||
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===UCSB-E-Phi-dev-3=== | ===UCSB-E-Phi-dev-3=== | ||
Revision as of 15:38, 13 January 2012
Contents
Planned runs for UCSB - E-Phi
Component test runs
UCSB-E-Phi-dev-1
SOI only: test litho and bonding uniformity
Planning:
- 12/14 ideas due;
- 01/11 mask review;
- 01/12 mask order sent out;
- 01/21 - 01/30 fabrication.
Components and structures
UCSB-E-Phi-dev-2
III/V lasers and SOAs on SOI;
Planning:
- 2.17.2012 Concepts for SOA spin due
- 3.02.2012 Fleshed-out designs for mask inclusion
- 3.16.2012 Designs ready for review (i.e. gds files)
- 3.30.2012 Mask tapeout deadline
- 4.15.2012 Processing begins
UCSB-E-Phi-dev-3
SOI passives coupled to ULLWs;
UCSB-E-Phi-dev-4
EDWA test run;
UCSB-E-Phi-dev-5
Isolator test run;
Shuttle runs
UCSB-E-Phi-1
III/V gain on SOI;
- 03/15 mask design finished;
- 04/31 fabrication finished;
UCSB-E-Phi-2
III/V gain and ULLWs on SOI;
UCSB-E-Phi-3
to be decided: either isolators or EDWAs on a III/V on SOI platform.
