Difference between revisions of "E-Beam Lithography (EBL)"

Revision as of 17:14, 25 March 2013

SEMs
- SEMs - 1st Chips - Pure ZEP dosage array: File:Pure ZEP SEMs.zip
- SEMs - 1st Chips - 2:1 ZEP dosage array: File:2 to 1 ZEP SEMs.zip
- SEMs - 2nd Chips - Pure ZEP dosage array: File:2ndChips Pure Zep-EBL Correction 3 22 13.zip
- SEMs - 2nd Chips - 2:1 ZEP dosage array: File:2ndChips 2 to 1 ZEP SEMs.zip

login to BEAMER server:

128.111.192.142

u:bowers

p:femto

Run a monte carlo simulation of the "substrate" and resist you are using in MC^3.

For example: ZEP(2k) on 500nm SOI with 1um BOx.

1) Use the drop down tab to select PENELOPE.

2) Build your layer stack in the PELELOPE GUI. z-Resolution must be an integer multiple of the thickness.

3) Check Save the result for the resist layer, for this example we have saved the "ZEP520_" layer

Revision as of 17:03, 25 March 2013 (edit) Jaredhulme (Talk \| contribs) ← Older edit		Revision as of 17:14, 25 March 2013 (edit) (undo) Jaredhulme (Talk \| contribs) Newer edit →
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	** SEMs - 2nd Chips - 2:1 ZEP dosage array: [[file:2ndChips_2_to_1 ZEP SEMs.zip]]<BR>		** SEMs - 2nd Chips - 2:1 ZEP dosage array: [[file:2ndChips_2_to_1 ZEP SEMs.zip]]<BR>

		+	** Excel Data : [[file:ProximityData.xlsx]]<BR>