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| * Remarks, results, optimization runs | | * Remarks, results, optimization runs |
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− | == Ebeam4 == | + | == Tools == |
− | * Very smooth sidewall profile
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− | * Great sidewall coverage if two directional rotation is used
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− | * Tool notes
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− | ** Pumping down around 1 hr
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− | ** Use group source
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− | * Check [[media:100520_Ebeam4 Probe Metal Deposition.ppt|Deposit Report]] for images using two different orientation for deposition
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− | == Deep RIE (Bosch Etcher) ==
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− | Restart instructions:
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− | Note:You may have to wait for the temperature to stabilize between some of these steps.
| + | [[AutoStep 200]] |
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− | 1) Restart computer
| + | [[Deep RIE Bosch Etcher]] |
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− | 2) Log in info (only required when restarting) Username: 3333, Password: 3333
| + | [[DUV Stepper]] |
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− | 3) Click the "ON" button (in the bottom left)
| + | [[Ebeam4]] |
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− | 4) Utilities->Turbo Pump ON
| + | [[E-Beam Lithography (EBL)]] |
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− | 5) Click "Standby" button (again in bottom left)
| + | [[ICP 2]] |
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− | 6) Service->Maintenance->Pump->System (Turbo Pump)
| + | [[Spin-Rinse-Dry]] |
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− | 7) Process->Batch...File->Load...Select a batch file to load, then close window
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− | 8) Click "Ready" button (again in bottom left)
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− | 9) Windows->Overview Diagram...and...You should be ready to go.
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− | == DUV STEPPER ==
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− | Current - DUV Stepper Waveguides: [[Media:DUV_Stepper_Waveguides_Development.pptx]]
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− | DUV Stepper Waveguides Update: [[Media:DUV Stepper Waveguides_2.pptx]]
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− | DUV Stepper Waveguides Update: [[Media:DUV Stepper Waveguides_1.pptx]]
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− | [[Media:DUV_Lithography_Test_on_Si.rar]]
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− | ===160C Bake===
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− | SEMs - Dies 21-24: [[File:SEM_Gratings_8_1_12.zip]]
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− | Microscope Pics - After 20 min Nanostrip: [[File:Post_20min_NanoStrip_8_10_12.zip]]
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− | ===170C Bake===
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− | ===180C Bake===
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