Difference between revisions of "Cleanroom Equipment"

From OptoelectronicsWiki
Jump to: navigation, search
(Tools)
 
(9 intermediate revisions by 2 users not shown)
Line 3: Line 3:
 
* Remarks, results, optimization runs
 
* Remarks, results, optimization runs
  
== Ebeam4 ==
+
== Tools ==
* Very smooth sidewall profile
+
* Great sidewall coverage if two directional rotation is used
+
* Tool notes
+
** Pumping down around 1 hr
+
** Use group source
+
* Check [[media:100520_Ebeam4 Probe Metal Deposition.ppt|Deposit Report]] for images using two different orientation for deposition
+
  
== Deep RIE (Bosch Etcher) ==
 
Restart instructions:
 
  
Note:You may have to wait for the temperature to stabilize between some of these steps.
+
 [[AutoStep 200]]  
  
1) Restart computer
+
 [[Deep RIE Bosch Etcher]]  
  
2) Log in info (only required when restarting) Username: 3333, Password: 3333
+
 [[DUV Stepper]]  
  
3) Click the "ON" button (in the bottom left)
+
 [[Ebeam4]]  
  
4) Utilities->Turbo Pump ON
+
 [[E-Beam Lithography (EBL)]]  
  
5) Click "Standby" button (again in bottom left)
+
 [[ICP 2]]  
  
6) Service->Maintenance->Pump->System (Turbo Pump)
 
 
7) Process->Batch...File->Load...Select a batch file to load, then close window
 
 
8) Click "Ready" button (again in bottom left)
 
 
9) Windows->Overview Diagram...and...You should be ready to go.
 
 
== DUV STEPPER ==
 
Current - DUV Stepper Waveguides: [[Media:DUV_Stepper_Waveguides_Development.pptx]]
 
 
DUV Stepper Waveguides Update: [[Media:DUV Stepper Waveguides_2.pptx]]
 
 
DUV Stepper Waveguides Update: [[Media:DUV Stepper Waveguides_1.pptx]]
 
 
 
Additional files for
 
 [[DUV Lithography Characterization]]  
 
 
== Spin-Rinse-Dry ==
 
 
 [[Spin-Rinse-Dry]]  
 
 [[Spin-Rinse-Dry]]  

Latest revision as of 12:33, 18 April 2013

  • List of tools, manuals, links to NanoFab
  • Bowers-specific processes
  • Remarks, results, optimization runs

Tools[edit]

 AutoStep 200  

 Deep RIE Bosch Etcher  

 DUV Stepper  

 Ebeam4  

 E-Beam Lithography (EBL)  

 ICP 2  

 Spin-Rinse-Dry