Difference between revisions of "Cleanroom Equipment"
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* Remarks, results, optimization runs | * Remarks, results, optimization runs | ||
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| + | [[AutoStep 200]] | ||
| − | + | [[Deep RIE Bosch Etcher]] | |
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| − | + | [[DUV Stepper]] | |
| − | + | [[Ebeam4]] | |
| + | [[E-Beam Lithography (EBL)]] | ||
| − | + | [[ICP 2]] | |
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[[Spin-Rinse-Dry]] | [[Spin-Rinse-Dry]] | ||
Latest revision as of 12:33, 18 April 2013
- List of tools, manuals, links to NanoFab
- Bowers-specific processes
- Remarks, results, optimization runs
