Difference between revisions of "Cleanroom Equipment"
From OptoelectronicsWiki
(Created page with '== Tools == * List of tools, manuals, links to NanoFab * Bowers-specific processes * Remarks, results, optimization runs') |
Jaredhulme (Talk | contribs) (→Tools) |
||
| (54 intermediate revisions by 6 users not shown) | |||
| Line 1: | Line 1: | ||
| − | |||
* List of tools, manuals, links to NanoFab | * List of tools, manuals, links to NanoFab | ||
* Bowers-specific processes | * Bowers-specific processes | ||
* Remarks, results, optimization runs | * Remarks, results, optimization runs | ||
| + | |||
| + | == Tools == | ||
| + | |||
| + | |||
| + | [[AutoStep 200]] | ||
| + | |||
| + | [[Deep RIE Bosch Etcher]] | ||
| + | |||
| + | [[DUV Stepper]] | ||
| + | |||
| + | [[Ebeam4]] | ||
| + | |||
| + | [[E-Beam Lithography (EBL)]] | ||
| + | |||
| + | [[ICP 2]] | ||
| + | |||
| + | [[Spin-Rinse-Dry]] | ||
Latest revision as of 12:33, 18 April 2013
- List of tools, manuals, links to NanoFab
- Bowers-specific processes
- Remarks, results, optimization runs
