Difference between revisions of "Cleanroom Equipment"
From OptoelectronicsWiki
(Created page with '== Tools == * List of tools, manuals, links to NanoFab * Bowers-specific processes * Remarks, results, optimization runs') |
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* List of tools, manuals, links to NanoFab | * List of tools, manuals, links to NanoFab | ||
* Bowers-specific processes | * Bowers-specific processes | ||
* Remarks, results, optimization runs | * Remarks, results, optimization runs | ||
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| + | == Ebeam4 == | ||
| + | * [[media:100520_Ebeam4 Probe Metal Deposition.ppt|UCSB standard stepper frame]] | ||
| + | * Very smooth sidewall profile | ||
| + | * Great sidewall coverage if two directional rotation is used | ||
| + | * Tool notes | ||
| + | ** Pumping down around 1 hr | ||
| + | ** Use group source | ||
Revision as of 18:46, 8 November 2010
- List of tools, manuals, links to NanoFab
- Bowers-specific processes
- Remarks, results, optimization runs
Ebeam4
- UCSB standard stepper frame
- Very smooth sidewall profile
- Great sidewall coverage if two directional rotation is used
- Tool notes
** Pumping down around 1 hr ** Use group source
