Difference between revisions of "Cleanroom Equipment"
From OptoelectronicsWiki
(→Ebeam4) |
(→Ebeam4) |
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== Ebeam4 == | == Ebeam4 == | ||
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* Very smooth sidewall profile | * Very smooth sidewall profile | ||
* Great sidewall coverage if two directional rotation is used | * Great sidewall coverage if two directional rotation is used | ||
| Line 10: | Line 9: | ||
** Pumping down around 1 hr | ** Pumping down around 1 hr | ||
** Use group source | ** Use group source | ||
| + | * Check [[media:100520_Ebeam4 Probe Metal Deposition.ppt|Deposit Report]] for images using two different orientation for deposition | ||
Revision as of 18:48, 8 November 2010
- List of tools, manuals, links to NanoFab
- Bowers-specific processes
- Remarks, results, optimization runs
Ebeam4
- Very smooth sidewall profile
- Great sidewall coverage if two directional rotation is used
- Tool notes
** Pumping down around 1 hr ** Use group source
- Check Deposit Report for images using two different orientation for deposition
