Difference between revisions of "Cleanroom Equipment"
From OptoelectronicsWiki
(→Ebeam4) |
(→Ebeam4) |
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* Great sidewall coverage if two directional rotation is used | * Great sidewall coverage if two directional rotation is used | ||
* Tool notes | * Tool notes | ||
| − | + | ** Pumping down around 1 hr | |
| − | + | ** Use group source | |
| − | * Check [[media:100520_Ebeam4 Probe Metal Deposition.ppt|Deposit Report]] for images using two different orientation for deposition | + | ** Check [[media:100520_Ebeam4 Probe Metal Deposition.ppt|Deposit Report]] for images using two different orientation for deposition |
Revision as of 18:48, 8 November 2010
- List of tools, manuals, links to NanoFab
- Bowers-specific processes
- Remarks, results, optimization runs
Ebeam4
- Very smooth sidewall profile
- Great sidewall coverage if two directional rotation is used
- Tool notes
- Pumping down around 1 hr
- Use group source
** Check Deposit Report for images using two different orientation for deposition
