Difference between revisions of "Cleanroom Equipment"

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(Spin-Rinse-Dry (SRD) - Bay 7)
(Tools)
 
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* Remarks, results, optimization runs
 
* Remarks, results, optimization runs
  
== Ebeam4 ==
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== Tools ==
* Very smooth sidewall profile
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* Great sidewall coverage if two directional rotation is used
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* Tool notes
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** Pumping down around 1 hr
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** Use group source
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* Check [[media:100520_Ebeam4 Probe Metal Deposition.ppt|Deposit Report]] for images using two different orientation for deposition
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[[Spin-Rinse-Dry (SRD) - Bay #7]]
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== Deep RIE (Bosch Etcher) ==
 
Restart instructions:
 
  
Note:You may have to wait for the temperature to stabilize between some of these steps.
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 [[AutoStep 200]]  
  
1) Restart computer
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 [[Deep RIE Bosch Etcher]]  
  
2) Log in info (only required when restarting) Username: 3333, Password: 3333
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 [[DUV Stepper]]  
  
3) Click the "ON" button (in the bottom left)
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 [[Ebeam4]]  
  
4) Utilities->Turbo Pump ON
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 [[E-Beam Lithography (EBL)]]  
  
5) Click "Standby" button (again in bottom left)
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 [[ICP 2]]  
  
6) Service->Maintenance->Pump->System (Turbo Pump)
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 [[Spin-Rinse-Dry]]  
 
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7) Process->Batch...File->Load...Select a batch file to load, then close window
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8) Click "Ready" button (again in bottom left)
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9) Windows->Overview Diagram...and...You should be ready to go.
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== DUV STEPPER - Bay 7==
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Current - DUV Stepper Waveguides: [[Media:DUV_Stepper_Waveguides_Development.pptx]]
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DUV Stepper Waveguides Update: [[Media:DUV Stepper Waveguides_2.pptx]]
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DUV Stepper Waveguides Update: [[Media:DUV Stepper Waveguides_1.pptx]]
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Additional files for
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 [[DUV Lithography Characterization]]  
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== Spin-Rinse-Dry ==
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1) Load wafers facing the back of the chamber.
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2) Press "Power" button.
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3) Turn switch to "Hand". (Switch is located behind the tool)
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4) Turn on water valve so the handle is vertical and in line with the pipe.
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(Valve is located behind the tool)
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5) Press "Start" button (Green button below the power button).  Make sure you see water spraying.
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6) Wait until dry cycle begins.
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7) Turn switch back to "Auto".
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8) Turn water valve off.
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9) Remove samples when finished.
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10) Press "Power" button.
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Latest revision as of 12:33, 18 April 2013

  • List of tools, manuals, links to NanoFab
  • Bowers-specific processes
  • Remarks, results, optimization runs

Tools[edit]

 AutoStep 200  

 Deep RIE Bosch Etcher  

 DUV Stepper  

 Ebeam4  

 E-Beam Lithography (EBL)  

 ICP 2  

 Spin-Rinse-Dry