Difference between revisions of "E-Beam Lithography (EBL)"
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+ | == New resist (CSAR) | ||
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== Proximity Correction == | == Proximity Correction == | ||
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+ | * [[media:Proximity Effect Correction for Electron Beam Lithography3.ppt|Proximity Effect Correction Experiment - Most Recent Version]] | ||
+ | * [[Proximity Correction PPT Past Versions]] | ||
+ | |||
+ | * SEMs | ||
+ | ** SEMs - 1st Chips - Pure ZEP dosage array: [[file:Pure ZEP SEMs.zip]]<BR> | ||
+ | ** SEMs - 1st Chips - 2:1 ZEP dosage array: [[file:2_to_1 ZEP SEMs.zip]]<BR> | ||
+ | ** SEMs - 2nd Chips - Pure ZEP dosage array: [[file:2ndChips_Pure Zep-EBL Correction_3_22_13.zip]]<BR> | ||
+ | ** SEMs - 2nd Chips - 2:1 ZEP dosage array: [[file:2ndChips_2_to_1 ZEP SEMs.zip]]<BR> | ||
+ | |||
+ | ** Excel Data : [[file:ProximityData.xlsx]]<BR> | ||
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+ | * BeamerCal5 - Photonic crystal and grating arrays: [[file:5_beamercal5.zip]]<BR> | ||
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+ | login to BEAMER server: | ||
+ | |||
+ | 128.111.192.87 | ||
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+ | u:bowers | ||
+ | |||
+ | p:bowers | ||
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+ | Run a monte carlo simulation of the "substrate" and resist you are using in MC^3. | ||
+ | |||
+ | For example: ZEP(2k) on 500nm SOI with 1um BOx. | ||
+ | |||
+ | 1) Use the drop down tab to select PENELOPE. | ||
+ | |||
+ | 2) Build your layer stack in the PELELOPE GUI. z-Resolution must be an integer multiple of the thickness. | ||
+ | |||
+ | 3) Check Save the result for the resist layer, for this example we have saved the "ZEP520_" layer | ||
Return to [[Cleanroom_Equipment]] | Return to [[Cleanroom_Equipment]] |
Latest revision as of 15:41, 12 May 2014
== New resist (CSAR)
Proximity Correction[edit]
- SEMs
- SEMs - 1st Chips - Pure ZEP dosage array: File:Pure ZEP SEMs.zip
- SEMs - 1st Chips - 2:1 ZEP dosage array: File:2 to 1 ZEP SEMs.zip
- SEMs - 2nd Chips - Pure ZEP dosage array: File:2ndChips Pure Zep-EBL Correction 3 22 13.zip
- SEMs - 2nd Chips - 2:1 ZEP dosage array: File:2ndChips 2 to 1 ZEP SEMs.zip
- SEMs - 1st Chips - Pure ZEP dosage array: File:Pure ZEP SEMs.zip
- Excel Data : File:ProximityData.xlsx
- Excel Data : File:ProximityData.xlsx
- BeamerCal5 - Photonic crystal and grating arrays: File:5 beamercal5.zip
login to BEAMER server:
128.111.192.87
u:bowers
p:bowers
Run a monte carlo simulation of the "substrate" and resist you are using in MC^3.
For example: ZEP(2k) on 500nm SOI with 1um BOx.
1) Use the drop down tab to select PENELOPE.
2) Build your layer stack in the PELELOPE GUI. z-Resolution must be an integer multiple of the thickness.
3) Check Save the result for the resist layer, for this example we have saved the "ZEP520_" layer
Return to Cleanroom_Equipment