Difference between revisions of "UCSB E-Phi Runs"
From OptoelectronicsWiki
| Line 2: | Line 2: | ||
==Component test runs== | ==Component test runs== | ||
| − | ===UCSB-E-Phi- | + | ===UCSB-E-Phi-dev-1=== |
SOI only: test litho and bonding uniformity <br> | SOI only: test litho and bonding uniformity <br> | ||
Planning: | Planning: | ||
| Line 25: | Line 25: | ||
** Taper from 0.8um to 2.0um, change taper length/shape [Sid, Geza] | ** Taper from 0.8um to 2.0um, change taper length/shape [Sid, Geza] | ||
| − | ===UCSB-E-Phi- | + | ===UCSB-E-Phi-dev-2=== |
III/V lasers and SOAs on SOI; | III/V lasers and SOAs on SOI; | ||
Planning: | Planning: | ||
| Line 31: | Line 31: | ||
* 02/29 fabrication finished; | * 02/29 fabrication finished; | ||
| − | ===UCSB-E-Phi- | + | ===UCSB-E-Phi-dev-3=== |
SOI passives coupled to ULLWs; | SOI passives coupled to ULLWs; | ||
| − | ===UCSB-E-Phi- | + | ===UCSB-E-Phi-dev-4=== |
EDWA test run; | EDWA test run; | ||
| − | ===UCSB-E-Phi- | + | ===UCSB-E-Phi-dev-5=== |
Isolator test run; | Isolator test run; | ||
Revision as of 19:40, 12 January 2012
Contents
Planned runs for UCSB - E-Phi
Component test runs
UCSB-E-Phi-dev-1
SOI only: test litho and bonding uniformity
Planning:
- 12/14 ideas due;
- 01/11 mask review;
- 01/12 mask order sent out;
- 01/21 - 01/30 fabrication.
Components and structures
- Bonding test structures
- Patterns for bonding [Di, Martijn]
- SOI waveguide test structures
- Resolution markers, Taper tip test structure [Sudha]
- Loss test structures [Martijn]
- SOI component test structures
- MMIs [Martijn, Yongbo]
- Bends [Martijn]
- Offsets [Martijn]
- 10-GHz and 20-GHz ring filters/oscillators [Martijn]
- Other ideas
- WG crossing [Sid]
- Silicon nanowire tapers [Jock]
- Taper from 0.8um to 2.0um, change taper length/shape [Sid, Geza]
UCSB-E-Phi-dev-2
III/V lasers and SOAs on SOI; Planning:
- 01/31 mask design finished;
- 02/29 fabrication finished;
UCSB-E-Phi-dev-3
SOI passives coupled to ULLWs;
UCSB-E-Phi-dev-4
EDWA test run;
UCSB-E-Phi-dev-5
Isolator test run;
Shuttle runs
UCSB-E-Phi-1
III/V gain on SOI;
- 03/15 mask design finished;
- 04/31 fabrication finished;
UCSB-E-Phi-2
III/V gain and ULLWs on SOI;
UCSB-E-Phi-3
to be decided: either isolators or EDWAs on a III/V on SOI platform.
