Difference between revisions of "HSP priority list"
From OptoelectronicsWiki
| Line 2: | Line 2: | ||
==Priority list== | ==Priority list== | ||
| + | * Process development: | ||
| + | ** Etch-back module (Jock, Jared) | ||
| + | ** Need to | ||
* III/V epi design | * III/V epi design | ||
** Finalize design | ** Finalize design | ||
** Order epi | ** Order epi | ||
* III/V SOA design | * III/V SOA design | ||
| − | * III/V SOA mask design ([[UCSB E-Phi Runs]]) | + | * III/V SOA mask design (UCSB-E-Phi-dev-2 @ [[UCSB E-Phi Runs]]) |
| − | + | ** Issue: Epi will arrive > 3 months -> test process follower with OPSIS run? | |
Revision as of 19:44, 12 January 2012
Contents
Agenda & Priority List
Priority list
- Process development:
- Etch-back module (Jock, Jared)
- Need to
- III/V epi design
- Finalize design
- Order epi
- III/V SOA design
- III/V SOA mask design (UCSB-E-Phi-dev-2 @ UCSB E-Phi Runs)
- Issue: Epi will arrive > 3 months -> test process follower with OPSIS run?
Issues brought up in meetings
05/01/2012
- Jon P.: Resist nonuniformity for multiple-die exposure -> >= 1-cm stay-out area?
- Jock: Grating module works for etch depths < 120 nm
- Bandgap issue: PL peak is not equal to lasing wavelength, and lasing wavelength is not equal to SOA gain maximum
- First have nice gain spectrum before we discuss further
