Difference between revisions of "E-Beam Lithography (EBL)"

Revision as of 15:39, 20 February 2013

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u:bowers

p:femto

Run a monte carlo simulation of the "substrate" and resist you are using in MC^3.

For example: ZEP(2k) on 500nm SOI with 1um BOx.

1) Use the drop down tab to select PENELOPE.

2) Build your layer stack in the PELELOPE GUI. z-Resolution must be an integer multiple of the thickness.

3) Check Save the result for the resist layer, for this example we have saved the "ZEP520_" layer

@@ Line 4: / Line 4: @@
 ** SEMs of Pure ZEP dosage array: [[file:Pure ZEP SEMs.zip]]<BR>
 ** SEMs of 2:1 ZEP dosage array: [[file:2_to_1 ZEP SEMs.zip]]<BR>
-*&nbsp;[[Proximity Correct PPT Past Versions]] &nbsp;
+*&nbsp;[[Proximity Correction PPT Past Versions]] &nbsp;