Difference between revisions of "SOI grating definition"
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| − | . | + | ==Unfinalized Processes== |
| + | Standad EBL Spin,Bake, Exposure, Develop | ||
| + | |||
| + | Spin AZ4210 (4000rpm, 30sec) | ||
| + | Pre-Exposure Bake (95C, 1min) | ||
| + | |||
| + | Lithography | ||
| + | 30 GCA Stepper / Autostepper | ||
| + | Exposure: 3sec / 1sec (NEEDS CALIBRATION) | ||
| + | Focus Offset: 0 (NEEDS CALIBRATION) | ||
| + | NO POST-EXPOSURE BAKE | ||
| + | Develop (AZ400K 1:4 diluted, 1min) | ||
| + | DI Rinse | ||
| + | |||
| + | Partial deep grating etch | ||
| + | |||
| + | 4210 strip in ISO | ||
| + | |||
| + | Shallow grating etch/Complete deep grating etch. | ||
| + | |||
| + | ZEP Strip (1165) | ||
Revision as of 18:44, 27 October 2011
Unfinalized Processes
Standad EBL Spin,Bake, Exposure, Develop
Spin AZ4210 (4000rpm, 30sec) Pre-Exposure Bake (95C, 1min)
Lithography 30 GCA Stepper / Autostepper
Exposure: 3sec / 1sec (NEEDS CALIBRATION) Focus Offset: 0 (NEEDS CALIBRATION) NO POST-EXPOSURE BAKE Develop (AZ400K 1:4 diluted, 1min) DI Rinse
Partial deep grating etch
4210 strip in ISO
Shallow grating etch/Complete deep grating etch.
ZEP Strip (1165)
