Difference between revisions of "Epitaxy layer design"
From OptoelectronicsWiki
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==Suggestions for revisions== | ==Suggestions for revisions== | ||
===Electron Blocking Layer=== | ===Electron Blocking Layer=== | ||
| + | {| border="3" | ||
| + | |+ '''Hybrid Silicon Process Modules''' | ||
| + | |- style="background:slategrey; color:white" | ||
| + | ! Pros !! Cons !! note | ||
| + | |- | ||
| + | | [[Epitaxy layer design]]|| - No well-developed design method (tools, softwares?) <br> - No reliable quick-verification method || - Survey on EPI designs from growers, literature and other groups | ||
| + | |- | ||
| + | |} | ||
Revision as of 10:58, 16 December 2011
Back to Process_Hybrid_Silicon.
Current EPI Structure
Suggestions for revisions
Electron Blocking Layer
| Pros | Cons | note |
|---|---|---|
| Epitaxy layer design | - No well-developed design method (tools, softwares?) - No reliable quick-verification method |
- Survey on EPI designs from growers, literature and other groups |
