Difference between revisions of "HSP priority list"
From OptoelectronicsWiki
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=Agenda & Priority List= | =Agenda & Priority List= | ||
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==Priority list== | ==Priority list== | ||
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** Issue: Epi will arrive > 3 months -> test process follower with OPSIS run? | ** Issue: Epi will arrive > 3 months -> test process follower with OPSIS run? | ||
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==Issues brought up in meetings== | ==Issues brought up in meetings== | ||
Revision as of 19:56, 12 January 2012
Contents
Agenda & Priority List
Back to Process_Hybrid_Silicon.
Priority list
- Process development:
- Etch-back module (Jock, Jared)
- Need to
- III/V epi design
- Finalize design
- Order epi
- III/V SOA design
- III/V SOA mask design (UCSB-E-Phi-dev-2 @ UCSB E-Phi Runs)
- Issue: Epi will arrive > 3 months -> test process follower with OPSIS run?
Issues brought up in meetings
06/01/2012
- Jon P.: Resist nonuniformity for multiple-die exposure -> >= 1-cm stay-out area?
- Jock: Grating module works for etch depths < 120 nm
- Bandgap issue: PL peak is not equal to lasing wavelength, and lasing wavelength is not equal to SOA gain maximum
- First have nice gain spectrum before we discuss further
