Difference between revisions of "HSP priority list"
From OptoelectronicsWiki
| Line 6: | Line 6: | ||
* Process development: | * Process development: | ||
** Etch-back module (Jock, Jared) | ** Etch-back module (Jock, Jared) | ||
| − | ** Need to | + | ** Need to converge on process follow (Excel?) |
* III/V epi design | * III/V epi design | ||
** Finalize design | ** Finalize design | ||
Revision as of 20:35, 12 January 2012
Contents
Agenda & Priority List
Back to Process Hybrid Silicon.
Priority list
- Process development:
- Etch-back module (Jock, Jared)
- Need to converge on process follow (Excel?)
- III/V epi design
- Finalize design
- Order epi
- III/V SOA design
- III/V SOA mask design (UCSB-E-Phi-dev-2 @ UCSB E-Phi Runs)
- Issue: Epi will arrive > 3 months -> test process follower with OPSIS run?
Issues brought up in meetings
06/01/2012
- Jon P.: Resist nonuniformity for multiple-die exposure -> >= 1-cm stay-out area?
- Jock: Grating module works for etch depths < 120 nm
- Bandgap issue: PL peak is not equal to lasing wavelength, and lasing wavelength is not equal to SOA gain maximum
- First have nice gain spectrum before we discuss further
