Difference between revisions of "Cleanroom Equipment"
From OptoelectronicsWiki
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Jaredhulme (Talk | contribs) (→Tools) |
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== Tools == | == Tools == | ||
− | + | ||
[[Deep RIE Bosch Etcher]] | [[Deep RIE Bosch Etcher]] | ||
[[DUV Stepper]] | [[DUV Stepper]] | ||
+ | |||
+ | [[Ebeam4]] | ||
+ | |||
+ | [[E-Beam Lithography (EBL)]] | ||
[[ICP 2]] | [[ICP 2]] | ||
[[Spin-Rinse-Dry]] | [[Spin-Rinse-Dry]] |
Revision as of 11:26, 19 February 2013
- List of tools, manuals, links to NanoFab
- Bowers-specific processes
- Remarks, results, optimization runs