Wafer Table (old)
From OptoelectronicsWiki
| Wafer ID | Substrate(um) | BOX(um) | Device layer (um) | Details of device layer | # bought | # remaining | Supplier | Note |
|---|---|---|---|---|---|---|---|---|
| 1I29437.1 | 675 | 1 | 0.7 | 0.2um 1E14 B, 0.5um 1E10 | 21 | 18 | SOITEC+LSRL | |
| 1I29437.1 | 675 | 1 | 0.4 | 0.2um 1E14 B, 0.2um 1E10 | 4 | 0 | SOITEC+LSRL |
| Wafer ID | Substrate(um) | BOX(um) | Device layer (um) | Details of device layer | Rib Etch (um) | # bought | # remaining | Supplier | Note | |||||||||||
|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|
| H4JYY8G | 1 | 0.7 | Undoped Si | 0.3 | 1 | 1/4 | umonyx/Intel | LASOR/PhASER | H4JYY8G | 1 | 0.7 | Undoped Si | 0.4 | 1 | 1 | umonyx/Intel | LASOR/PhASER | |||
| H4JYY8G | 1 | 0.7 | Undoped Si | 0.3 | 1 | 1 | umonyx/Intel | LASOR/PhASER, oxidation smooth | ||||||||||||
| Wafer ID | Layerstack | Data and spec-sheet | # bought | # remaining | Supplier | Design/simulation results |
|---|---|---|---|---|---|---|
| GLDA0908271-C | 5 | 3 | LandMark | |||
