E-Beam Lithography (EBL)
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Revision as of 15:34, 20 February 2013 by Jaredhulme (Talk | contribs)
Proximity Correction
Process overview: File:SWEEPER4-1 v4.ppt
SEMs of Pure ZEP dosage array: File:Pure ZEP SEMs.zip
SEMs of 2:1 ZEP dosage array: File:2 to 1 ZEP SEMs.zip
login to BEAMER server:
128.111.192.142
u:bowers
p:femto
Run a monte carlo simulation of the "substrate" and resist you are using in MC^3.
For example: ZEP(2k) on 500nm SOI with 1um BOx.
1) Use the drop down tab to select PENELOPE.
2) Build your layer stack in the PELELOPE GUI. z-Resolution must be an integer multiple of the thickness.
3) Check Save the result for the resist layer, for this example we have saved the "ZEP520_" layer
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