E-Beam Lithography (EBL)

Proximity Correction

• Proximity Effect Correction Experiment Updated
• Archive: Proximity Effect Correction Experiment

• Process overview: File:SWEEPER4-1 v4.ppt
  
• SEMs of Pure ZEP dosage array: File:Pure ZEP SEMs.zip
  
• SEMs of 2:1 ZEP dosage array: File:2 to 1 ZEP SEMs.zip
  

login to BEAMER server:

128.111.192.142

u:bowers

p:femto

Run a monte carlo simulation of the "substrate" and resist you are using in MC^3.

For example: ZEP(2k) on 500nm SOI with 1um BOx.

1) Use the drop down tab to select PENELOPE.

2) Build your layer stack in the PELELOPE GUI. z-Resolution must be an integer multiple of the thickness.

3) Check Save the result for the resist layer, for this example we have saved the "ZEP520_" layer

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