SOI grating definition

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Current Processes

Sweeper Vertical Grating Coupler Process

Process Development Summary

Dose/Duty Cycle Analysis with Proximity Effect Observations

PPT


Future Untested Processes

Sweeper Two Etch Depth Grating Process (INCOMPLETE)

Standad EBL Spin,Bake, Exposure, Develop

   Spin AZ4210 (4000rpm, 30sec)
   Pre-Exposure Bake (95C, 1min)
  

Lithography 30 GCA Stepper / Autostepper

   Exposure: 3sec / 1sec (NEEDS CALIBRATION)
   Focus Offset: 0 (NEEDS CALIBRATION)
   NO POST-EXPOSURE BAKE
   Develop (AZ400K 1:4 diluted, 1min)
   DI Rinse

Partial deep grating etch

4210 strip in ISO

Shallow grating etch/Complete deep grating etch.

ZEP Strip (1165)