E-Beam Lithography (EBL)

== New resist (CSAR)

Proximity Correction

• Proximity Effect Correction Experiment - Most Recent Version
•  Proximity Correction PPT Past Versions  

• SEMs
  • SEMs - 1st Chips - Pure ZEP dosage array: File:Pure ZEP SEMs.zip
    
  • SEMs - 1st Chips - 2:1 ZEP dosage array: File:2 to 1 ZEP SEMs.zip
    
  • SEMs - 2nd Chips - Pure ZEP dosage array: File:2ndChips Pure Zep-EBL Correction 3 22 13.zip
    
  • SEMs - 2nd Chips - 2:1 ZEP dosage array: File:2ndChips 2 to 1 ZEP SEMs.zip
    

• • Excel Data : File:ProximityData.xlsx
    

• BeamerCal5 - Photonic crystal and grating arrays: File:5 beamercal5.zip
  

login to BEAMER server:

128.111.192.87

u:bowers

p:bowers

Run a monte carlo simulation of the "substrate" and resist you are using in MC^3.

For example: ZEP(2k) on 500nm SOI with 1um BOx.

1) Use the drop down tab to select PENELOPE.

2) Build your layer stack in the PELELOPE GUI. z-Resolution must be an integer multiple of the thickness.

3) Check Save the result for the resist layer, for this example we have saved the "ZEP520_" layer

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