Chips Table

Chip table

Run ID	wafer	mask	process flow	process follower	operator	logbook	results
SOIBuffer2R 1
SOIBuffer2R 2							Grass during mesa etch. New batch started.
SOIBuffer2R 3							Negative PR residue over III-V couldn't be cleaned off. Process follower adjusted.
SOIBuffer2R 4							Testing in progress
#1727 W394	Jared design	Lionix	80-nm core
#1727 W395	Jared design	Lionix	80-nm core