DUV Stepper development
From OptoelectronicsWiki
Planning[edit]
- Martijn will compile final mask design; Jock will coordinate full mask plate design;
- All designers (see below) send design (detailed geometry) and proposed splits to Martijn before May 17.
Specs[edit]
Total mask area 26x22mm.
PULSAR takes the top 8mm of this mask.
2 Layers on 500nm SOI - 250nm Si etch, 500nm Si Etch.
Each Si layer is approximately 13x14mm.
Ideas for test mask[edit]
1) Reflector based on photonic crystal or Bragg Grating/Sampled Bragg Grating -- JKD
2) DC's, star couplers -- Martijn
3) side gratings -- Michael D
4) resolution markers -- Sudha
5) Grating pattern (etching Lag effect) File:LagGrating.gds -- Yongbo
6) polarization converters/rotators by using off-center longitudinal trenches -- open
7) Ring, MZI-Ring, two-bus ring, EIT Dual Ring(if there is space), S-bended Ring -- Yongbo
8) Tapers (polished to check the mode profile), two-level tapers -- Jock
