Difference between revisions of "Si/Ge PD"
From OptoelectronicsWiki
(Created page with "= Overview = = Gen 1: surface-normal PD = == Design == == Fabrication == = Gen 2: waveguide PD = == Design == == Fabrication == Fabrication for the waveguide design is co...") |
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− | Fabrication for the waveguide design is composed of two parts: pre-growth Si processing and post-growth processing. The pre-growth processing included n-implant and annealing steps. Since this had not been done by our group before, I did a brief experiment to ensure that the final doping would match the designed doping. A description of | + | Fabrication for the waveguide design is composed of two parts: pre-growth Si processing and post-growth processing. The pre-growth processing included n-implant and annealing steps. Since this had not been done by our group before, I did a brief experiment to ensure that the final doping would match the designed doping. A description of the experiment is below. |
+ | |||
+ | The full process flow is here: [[file:WGPD_fullprocess.pptx]] | ||
+ | |||
+ | = General fabrication process development = | ||
+ | |||
+ | == Vertical Ge etching== | ||
+ | ICP etches using Cl, CF4, and SF6 chemistries: [[file: Vertical_Ge_etching.pptx]] | ||
+ | == N-implant verification== | ||
+ | Phosphorous implant in Silicon: [[file:N-implant_verification.pptx]] |
Revision as of 12:30, 18 January 2012
Contents
Overview
Gen 1: surface-normal PD
Design
Fabrication
Gen 2: waveguide PD
Design
Fabrication
Fabrication for the waveguide design is composed of two parts: pre-growth Si processing and post-growth processing. The pre-growth processing included n-implant and annealing steps. Since this had not been done by our group before, I did a brief experiment to ensure that the final doping would match the designed doping. A description of the experiment is below.
The full process flow is here: File:WGPD fullprocess.pptx
General fabrication process development
Vertical Ge etching
ICP etches using Cl, CF4, and SF6 chemistries: File:Vertical Ge etching.pptx
N-implant verification
Phosphorous implant in Silicon: File:N-implant verification.pptx