Difference between revisions of "Cleanroom Equipment"

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(Ebeam4)
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* Remarks, results, optimization runs
 
* Remarks, results, optimization runs
  
== Ebeam4 ==
 
 
 [[Ebeam4]]  
 
 [[Ebeam4]]  
  
== Deep RIE (Bosch Etcher) ==
 
 
 [[Deep RIE Bosch Etcher]]  
 
 [[Deep RIE Bosch Etcher]]  
  
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 [[DUV Lithography Characterization]]  
 
 [[DUV Lithography Characterization]]  
  
== Spin-Rinse-Dry ==
 
 
 [[Spin-Rinse-Dry]]  
 
 [[Spin-Rinse-Dry]]  

Revision as of 11:53, 15 August 2012

  • List of tools, manuals, links to NanoFab
  • Bowers-specific processes
  • Remarks, results, optimization runs

 Ebeam4  

 Deep RIE Bosch Etcher  


DUV STEPPER

Current - DUV Stepper Waveguides: Media:DUV_Stepper_Waveguides_Development.pptx

DUV Stepper Waveguides Update: Media:DUV Stepper Waveguides_2.pptx

DUV Stepper Waveguides Update: Media:DUV Stepper Waveguides_1.pptx


Additional files for  DUV Lithography Characterization  

 Spin-Rinse-Dry