Difference between revisions of "E-Beam Lithography (EBL)"

Revision as of 11:57, 20 February 2013

login to BEAMER server:

128.111.192.142

u:bowers

p:femto

Run a monte carlo simulation of the "substrate" and resist you are using in MC^3.

For example: ZEP(2k) on 500nm SOI with 1um BOx.

1) Use the drop down tab to select PENELOPE.

2) Build your layer stack in the PELELOPE GUI. z-Resolution must be an integer multiple of the thickness.

3) Check Save the result for the resist layer, for this example we have saved the "ZEP520_" layer

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 * [[media:Proximity Effect Correction for Electron Beam Lithography.ppt|Proximity Effect Correction Experiment]]
+login to BEAMER server:
+.111.192.142
+u:bowers
+p:femto
+Run a monte carlo simulation of the "substrate" and resist you are using in MC^3.
+For example: ZEP(2k) on 500nm SOI with 1um BOx.
+) Use the drop down tab to select PENELOPE.
+) Build your layer stack in the PELELOPE GUI. z-Resolution must be an integer multiple of the thickness.
+) Check Save the result for the resist layer, for this example we have saved the "ZEP520_" layer
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