User contributions
From OptoelectronicsWiki
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- 16:15, 7 November 2013 (diff | hist) . . (+638) . . Simulation/Fimmwave-Fimmprop
- 15:48, 24 October 2013 (diff | hist) . . (+28) . . Mask Software tools (→Libmask)
- 15:38, 25 August 2013 (diff | hist) . . (+75) . . Mask Order (→Some things you might need to know)
- 20:20, 27 February 2013 (diff | hist) . . (+39) . . Mask Software tools (→KLayout (with Ruby scripting for layer addition, subtraction, rotation and shifting))
- 20:19, 27 February 2013 (diff | hist) . . (0) . . Mask Software tools (→KLayout (with Ruby scripting for layer addition, subtraction, rotation and shifting))
- 20:19, 27 February 2013 (diff | hist) . . (+1) . . Mask Software tools (→KLayout (with Ruby scripting for layer addition, subtraction, rotation and shifting))
- 20:18, 27 February 2013 (diff | hist) . . (+1) . . Mask Software tools (→KLayout (with Ruby scripting for layer addition, subtraction, rotation and shifting))
- 20:18, 27 February 2013 (diff | hist) . . (+37) . . Mask Software tools (→KLayout (with Ruby scripting for layer addition, subtraction, rotation and shifting))
- 20:04, 27 February 2013 (diff | hist) . . (+3) . . Mask Software tools (→KLayout (with Ruby Script for layer addition, subtraction, rotation and shifting))
- 20:04, 27 February 2013 (diff | hist) . . (+675) . . Mask Software tools
- 11:57, 20 February 2013 (diff | hist) . . (+449) . . E-Beam Lithography (EBL)
- 20:36, 23 January 2013 (diff | hist) . . (-45) . . GaAs on Silica Hybrid Process (current)
- 20:34, 23 January 2013 (diff | hist) . . (+57) . . GaAs on Silica Hybrid Process
- 18:36, 27 November 2012 (diff | hist) . . (+21) . . Simulation/Fimmwave-Fimmprop (→License debug)
- 18:21, 27 November 2012 (diff | hist) . . (+7) . . Simulation/Fimmwave-Fimmprop (→License debug)
- 12:59, 19 September 2012 (diff | hist) . . (0) . . Simulation/Fimmwave-Fimmprop (→License debug)
- 12:44, 29 June 2012 (diff | hist) . . (+190) . . N DUV EPhi-1.2 SOI Passives-2 & Pulsar P,N,SL Layers (Created page with "Libmask Code GDS [[media:MASK_DESCRIPTION_-_DUV_EPhi-1.2_SOI_Passives-2_and_Pulsar_PNSL_Layers.ppt|Detailed Mask Descri...")
- 12:39, 29 June 2012 (diff | hist) . . (+1) . . Masks (→Shared /Calibration Masks)
- 12:39, 29 June 2012 (diff | hist) . . (+55) . . Masks (→Shared /Calibration Masks)
- 11:36, 20 June 2012 (diff | hist) . . (+47) . . Mask Order (→DUV Stepper Masks)
- 10:46, 4 May 2012 (diff | hist) . . (+2) . . SOI grating definition (→Dose/Duty Cycle Analysis with Proximity Effect Observations)
- 16:58, 27 April 2012 (diff | hist) . . (+299) . . Mask Order
- 16:54, 27 April 2012 (diff | hist) . . (-6) . . UCSB E-Phi Runs (→UCSB-E-Phi-dev-1DUV) (current)
- 11:37, 24 April 2012 (diff | hist) . . (+1) . . Mask Software tools (→Libmask)
- 11:37, 24 April 2012 (diff | hist) . . (+16) . . Mask Software tools (→Libmask)
- 11:36, 24 April 2012 (diff | hist) . . (+2) . . Mask Software tools (→Libmask)
- 11:36, 24 April 2012 (diff | hist) . . (+6) . . Mask Software tools (→Libmask)
- 11:36, 24 April 2012 (diff | hist) . . (+1,225) . . Mask Software tools (→Libmask)
- 16:12, 23 April 2012 (diff | hist) . . (+61) . . Vertical channel definition (current)
- 18:46, 8 April 2012 (diff | hist) . . (+2) . . SOI grating definition (→Past Processes)
- 15:23, 8 April 2012 (diff | hist) . . (+456) . . SOI grating definition (→Past Processes)
- 15:10, 8 April 2012 (diff | hist) . . (+13) . . SOI grating definition (→Sweeper Two Etch Depth Grating Process with ZEP(2:1)/Oxide/Cr/Oxide Mask)
- 15:05, 8 April 2012 (diff | hist) . . (+33) . . SOI grating definition (→Sweeper Two Etch Depth Grating Process)
- 15:03, 8 April 2012 (diff | hist) . . (-6) . . SOI grating definition (→Future Untested Processes)
- 15:02, 8 April 2012 (diff | hist) . . (+188) . . SOI grating definition (→Sweeper Two Etch Depth Grating Process (UNTESTED))
- 14:59, 8 April 2012 (diff | hist) . . (+2,252) . . SOI grating definition (→Past Processes)
- 14:47, 8 April 2012 (diff | hist) . . (+2) . . SOI grating definition (→Sweeper Vertical Grating Coupler Process (ZEP:Anisol(2:1) Soft mask, limited to shallow ~150-200nm Si gratings, used in SWEEPER for gratings <100nm))
- 14:47, 8 April 2012 (diff | hist) . . (+108) . . SOI grating definition (→Sweeper Vertical Grating Coupler Process)
- 16:04, 31 January 2012 (diff | hist) . . (+242) . . SOI grating definition (→Sweeper Two Etch Depth Grating Process (UNTESTED))
- 16:22, 19 January 2012 (diff | hist) . . (+466) . . SOI grating definition (→Sweeper Two Etch Depth Grating Process (UNTESTED))
- 16:14, 19 January 2012 (diff | hist) . . (+1,042) . . SOI grating definition (→Sweeper Two Etch Depth Grating Process (UNTESTED))
- 17:07, 21 December 2011 (diff | hist) . . (-25) . . SOI grating definition (→Sweeper Two Etch Depth Grating Process (UNTESTED))
- 15:37, 6 December 2011 (diff | hist) . . (+3) . . Simulation/Fimmwave-Fimmprop (→Scripting with jaredwave)
- 15:37, 6 December 2011 (diff | hist) . . (+556) . . Simulation/Fimmwave-Fimmprop (→Scripting with jaredwave)
- 11:48, 18 November 2011 (diff | hist) . . (+144) . . Process Hybrid Silica (current)
- 11:47, 18 November 2011 (diff | hist) . . (+1) . . Main Page (→Main Portal)
- 11:46, 18 November 2011 (diff | hist) . . (+576) . . N Process Hybrid Silica (Created page with "{| border="3" |+ '''Hybrid silica process overview''' |- style="background:red; color:white" ! Process ID !! Version !! Process flow !! Process follower !! Description |- | ULL...")
- 11:44, 18 November 2011 (diff | hist) . . (+48) . . Measurements (→Atomic Force Microscopy (AFM))
- 11:43, 18 November 2011 (diff | hist) . . (+68) . . Measurements (→NanoScope AFM)
- 11:39, 18 November 2011 (diff | hist) . . (-7) . . Measurements (→X-Ray Diffraction (XRD))
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