Difference between revisions of "Chips Table"

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! Run ID !! wafer !! mask !! process flow !! process follower !! operator !! logbook !! results  
 
! Run ID !! wafer !! mask !! process flow !! process follower !! operator !! logbook !! results  
 
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| SOIBuffer2R 1 ||   ||   ||   ||   ||   ||   || [[media:SOIBuffer2RBatch1.pptx | stuff]]
+
| SOIBuffer2R 1 ||   ||   ||   ||   ||   ||   || [[media:SOIBuffer2RBatch1.pptx | Summary of data.]]
 
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|-
 
| SOIBuffer2R 2 ||   ||   ||   ||   ||   ||   || Grass during mesa etch. New batch started.
 
| SOIBuffer2R 2 ||   ||   ||   ||   ||   ||   || Grass during mesa etch. New batch started.

Revision as of 09:48, 4 May 2010

Chip table
Run ID wafer mask process flow process follower operator logbook results
SOIBuffer2R 1             Summary of data.
SOIBuffer2R 2             Grass during mesa etch. New batch started.
SOIBuffer2R 3             Negative PR residue over III-V couldn't be cleaned off. Process follower adjusted.
SOIBuffer2R 4             Testing in progress
#1727 W394 Jared design Lionix 80-nm core        
#1727 W395 Jared design Lionix 80-nm core