Difference between revisions of "Chips Table"

Latest revision as of 13:43, 25 June 2010

**Chip table**
Run ID	wafer	mask	process flow	process follower	operator	results
SOIBuffer2R 1						Summary of data.
SOIBuffer2R 2						Grass during mesa etch. New batch started.
SOIBuffer2R 3						Negative PR residue over III-V couldn't be cleaned off. Process follower adjusted.
SOIBuffer2R 4				Process follower		Testing in progress
#1727 W394	Jared design	Lionix	80-nm core
#1727 W395	Jared design	Lionix	80-nm core
Short Loop 2010 06		SOIBuffer2R		Process follower	Geza	Testing in progress

@@ Line 4: / Line 4: @@
 ! Run ID !! wafer !! mask !! process flow !! process follower !! operator !! logbook !! results
 |-
-| test || &nbsp; || &nbsp; || &nbsp; || &nbsp; || &nbsp; || &nbsp; || &nbsp;
+| SOIBuffer2R 1 || &nbsp; || &nbsp; || &nbsp; || &nbsp; || &nbsp; || &nbsp; || [[media:SOIBuffer2RBatch1.pptx | Summary of data.]]
 |-
-| &nbsp; || &nbsp; || &nbsp; || &nbsp; || &nbsp; || &nbsp; || &nbsp; || &nbsp;
+| SOIBuffer2R 2 || &nbsp; || &nbsp; || &nbsp; || &nbsp; || &nbsp; || &nbsp; || Grass during mesa etch. New batch started.
 |-
-| &nbsp; || &nbsp; || &nbsp; || &nbsp; || &nbsp; || &nbsp; || &nbsp; || &nbsp;
+| SOIBuffer2R 3 || &nbsp; || &nbsp; || &nbsp; || &nbsp; || &nbsp; || &nbsp; || Negative PR residue over III-V couldn't be cleaned off. Process follower adjusted.
 |-
+| SOIBuffer2R 4 || &nbsp; || &nbsp; || &nbsp; || [[media:SOIBuffer2R_v2.6.docx | Process follower]] || &nbsp; || &nbsp; || Testing in progress
+|-
+| #1727 W394 || Jared design || Lionix || 80-nm core || &nbsp; || &nbsp; || &nbsp; || &nbsp;
+|-
+| #1727 W395 || Jared design || Lionix || 80-nm core || &nbsp; || &nbsp; || &nbsp; || &nbsp;
+|-
+| Short Loop 2010 06 || &nbsp; || SOIBuffer2R || &nbsp; || [[media:WG.xlsx | Process follower]] || Geza || &nbsp; || Testing in progress
+|-
 |}