Difference between revisions of "Chips Table"
From OptoelectronicsWiki
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| SOIBuffer2R 3 || || || || || || || Negative PR residue over III-V couldn't be cleaned off. Process follower adjusted. | | SOIBuffer2R 3 || || || || || || || Negative PR residue over III-V couldn't be cleaned off. Process follower adjusted. | ||
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| − | | SOIBuffer2R 4 || || || [[media:SOIBuffer2R_v2.6.docx | Process follower]] | + | | SOIBuffer2R 4 || || || || [[media:SOIBuffer2R_v2.6.docx | Process follower]] || || || Testing in progress |
|- | |- | ||
| #1727 W394 || Jared design || Lionix || 80-nm core || || || || | | #1727 W394 || Jared design || Lionix || 80-nm core || || || || | ||
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| #1727 W395 || Jared design || Lionix || 80-nm core || || || || | | #1727 W395 || Jared design || Lionix || 80-nm core || || || || | ||
|- | |- | ||
| − | + | | Short Loop 2010 06 || || SOIBuffer2R || || [[media:WG.xlsx | Process follower]] || Geza || || Testing in progress | |
| + | |- | ||
Latest revision as of 13:43, 25 June 2010
| Run ID | wafer | mask | process flow | process follower | operator | logbook | results |
|---|---|---|---|---|---|---|---|
| SOIBuffer2R 1 | Summary of data. | ||||||
| SOIBuffer2R 2 | Grass during mesa etch. New batch started. | ||||||
| SOIBuffer2R 3 | Negative PR residue over III-V couldn't be cleaned off. Process follower adjusted. | ||||||
| SOIBuffer2R 4 | Process follower | Testing in progress | |||||
| #1727 W394 | Jared design | Lionix | 80-nm core | ||||
| #1727 W395 | Jared design | Lionix | 80-nm core | ||||
| Short Loop 2010 06 | SOIBuffer2R | Process follower | Geza | Testing in progress |
