Difference between revisions of "Chips Table"

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| #1727 W395 || Jared design || Lionix || 80-nm core ||   ||   ||   ||  
 
| #1727 W395 || Jared design || Lionix || 80-nm core ||   ||   ||   ||  
 
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| Short Loop 2010 06 ||   || SOIBuffer2R ||   || [[media:SOIBuffer2R_v2.6.docx | Process follower]] || Geza ||   || Testing in progress
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| Short Loop 2010 06 ||   || SOIBuffer2R ||   || [[media:WG.xlsx | Process follower]] || Geza ||   || Testing in progress
 
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Latest revision as of 13:43, 25 June 2010

Chip table
Run ID wafer mask process flow process follower operator logbook results
SOIBuffer2R 1             Summary of data.
SOIBuffer2R 2             Grass during mesa etch. New batch started.
SOIBuffer2R 3             Negative PR residue over III-V couldn't be cleaned off. Process follower adjusted.
SOIBuffer2R 4       Process follower     Testing in progress
#1727 W394 Jared design Lionix 80-nm core        
#1727 W395 Jared design Lionix 80-nm core        
Short Loop 2010 06   SOIBuffer2R   Process follower Geza   Testing in progress