Difference between revisions of "Mesa Etching"

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(Created page with "Meas Etching: This page outlines our effort to improve the III-V mesa etch. == Processing == Process follower (Doc) The mask file is identical to th...")
 
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[[media:MesaEtching.docx|Process follower (Doc)]]
 
[[media:MesaEtching.docx|Process follower (Doc)]]
  
The mask file is identical to the mesa layer of the [[media:AWG_Mesa_Align.pptx|taper test mask]]taper test mask.
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The mask file is identical to the mesa layer of the [[media:AWG_Mesa_Align.pptx|taper test mask]].
  
  

Revision as of 14:31, 13 June 2011

Meas Etching: This page outlines our effort to improve the III-V mesa etch.


Processing

Process follower (Doc)

The mask file is identical to the mesa layer of the taper test mask.


Data

Work in progress.