Difference between revisions of "DUV Stepper development"
From OptoelectronicsWiki
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5) Grating pattern (etching Lag effect) | 5) Grating pattern (etching Lag effect) | ||
[[File:LagGrating.gds]] | [[File:LagGrating.gds]] | ||
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| + | 6) polarization converters/rotators by using off-center longitudinal trenches. | ||
Revision as of 20:51, 22 April 2012
Ideas for test mask.
1) photonic crystal like structures.
2) DC's, star couplers
3) side gratings.
4) resolution markers
5) Grating pattern (etching Lag effect) File:LagGrating.gds
6) polarization converters/rotators by using off-center longitudinal trenches.
