Difference between revisions of "Cleanroom Equipment"
From OptoelectronicsWiki
Jaredhulme (Talk | contribs) |
Jaredhulme (Talk | contribs) |
||
Line 12: | Line 12: | ||
== Deep RIE (Bosch Etcher) == | == Deep RIE (Bosch Etcher) == | ||
− | [[ | + | [[Deep RIE Bosch Etcher]] |
− | + | ||
− | |||
− | |||
− | |||
− | |||
− | |||
− | |||
− | |||
− | |||
− | |||
− | |||
− | |||
− | |||
− | |||
− | |||
− | |||
− | |||
− | |||
− | |||
− | |||
== DUV STEPPER == | == DUV STEPPER == |
Revision as of 11:51, 15 August 2012
- List of tools, manuals, links to NanoFab
- Bowers-specific processes
- Remarks, results, optimization runs
Ebeam4
- Very smooth sidewall profile
- Great sidewall coverage if two directional rotation is used
- Tool notes
- Pumping down around 1 hr
- Use group source
- Check Deposit Report for images using two different orientation for deposition
Deep RIE (Bosch Etcher)
DUV STEPPER
Current - DUV Stepper Waveguides: Media:DUV_Stepper_Waveguides_Development.pptx
DUV Stepper Waveguides Update: Media:DUV Stepper Waveguides_2.pptx
DUV Stepper Waveguides Update: Media:DUV Stepper Waveguides_1.pptx
Additional files for
DUV Lithography Characterization