Difference between revisions of "Si/Ge PD"

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(Created page with "= Overview = = Gen 1: surface-normal PD = == Design == == Fabrication == = Gen 2: waveguide PD = == Design == == Fabrication == Fabrication for the waveguide design is co...")
 
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== Fabrication ==
 
== Fabrication ==
  
Fabrication for the waveguide design is composed of two parts: pre-growth Si processing and post-growth processing.  The pre-growth processing included n-implant and annealing steps.  Since this had not been done by our group before, I did a brief experiment to ensure that the final doping would match the designed doping.  A description of this experiment can be found [[Media:N-implant_verification.pptx| here]].
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Fabrication for the waveguide design is composed of two parts: pre-growth Si processing and post-growth processing.  The pre-growth processing included n-implant and annealing steps.  Since this had not been done by our group before, I did a brief experiment to ensure that the final doping would match the designed doping.  A description of the experiment is below.
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The full process flow is here:  [[file:WGPD_fullprocess.pptx]]
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= General fabrication process development =
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== Vertical Ge etching==
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ICP etches using Cl, CF4, and SF6 chemistries: [[file: Vertical_Ge_etching.pptx]]
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== N-implant verification==
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Phosphorous implant in Silicon: [[file:N-implant_verification.pptx]]

Revision as of 12:30, 18 January 2012

Overview

Gen 1: surface-normal PD

Design

Fabrication

Gen 2: waveguide PD

Design

Fabrication

Fabrication for the waveguide design is composed of two parts: pre-growth Si processing and post-growth processing. The pre-growth processing included n-implant and annealing steps. Since this had not been done by our group before, I did a brief experiment to ensure that the final doping would match the designed doping. A description of the experiment is below.

The full process flow is here: File:WGPD fullprocess.pptx

General fabrication process development

Vertical Ge etching

ICP etches using Cl, CF4, and SF6 chemistries: File:Vertical Ge etching.pptx

N-implant verification

Phosphorous implant in Silicon: File:N-implant verification.pptx