Difference between revisions of "DUV Stepper development"
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* Martijn will compile final mask design; Jock will coordinate full mask plate design; | * Martijn will compile final mask design; Jock will coordinate full mask plate design; | ||
* All designers (see below) send design (detailed geometry) and proposed splits to Martijn before May 17. | * All designers (see below) send design (detailed geometry) and proposed splits to Martijn before May 17. | ||
| + | |||
| + | ===Specs=== | ||
| + | 2 Layers on 500nm SOI - 250nm Si etch, 500nm Si Etch | ||
| + | |||
| + | Each layer is approximately 13x14mm | ||
Revision as of 12:14, 1 June 2012
Planning
- Martijn will compile final mask design; Jock will coordinate full mask plate design;
- All designers (see below) send design (detailed geometry) and proposed splits to Martijn before May 17.
Specs
2 Layers on 500nm SOI - 250nm Si etch, 500nm Si Etch
Each layer is approximately 13x14mm
Ideas for test mask
1) Reflector based on photonic crystal or Bragg Grating/Sampled Bragg Grating -- JKD
2) DC's, star couplers -- Martijn
3) side gratings -- Michael D
4) resolution markers -- Sudha
5) Grating pattern (etching Lag effect) File:LagGrating.gds -- Yongbo
6) polarization converters/rotators by using off-center longitudinal trenches -- open
7) Ring, MZI-Ring, two-bus ring, EIT Dual Ring(if there is space), S-bended Ring -- Yongbo
8) Tapers (polished to check the mode profile), two-level tapers -- Jock
