Difference between revisions of "DUV Stepper development"
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===Specs=== | ===Specs=== | ||
| − | + | Total mask area 26x22mm. | |
| − | + | PULSAR takes the top 8mm of this mask. | |
| + | 2 Layers on 500nm SOI - 250nm Si etch, 500nm Si Etch. | ||
| + | |||
| + | Each Si layer is approximately 13x14mm. | ||
===Ideas for test mask=== | ===Ideas for test mask=== | ||
Latest revision as of 12:29, 1 June 2012
Planning[edit]
- Martijn will compile final mask design; Jock will coordinate full mask plate design;
- All designers (see below) send design (detailed geometry) and proposed splits to Martijn before May 17.
Specs[edit]
Total mask area 26x22mm.
PULSAR takes the top 8mm of this mask.
2 Layers on 500nm SOI - 250nm Si etch, 500nm Si Etch.
Each Si layer is approximately 13x14mm.
Ideas for test mask[edit]
1) Reflector based on photonic crystal or Bragg Grating/Sampled Bragg Grating -- JKD
2) DC's, star couplers -- Martijn
3) side gratings -- Michael D
4) resolution markers -- Sudha
5) Grating pattern (etching Lag effect) File:LagGrating.gds -- Yongbo
6) polarization converters/rotators by using off-center longitudinal trenches -- open
7) Ring, MZI-Ring, two-bus ring, EIT Dual Ring(if there is space), S-bended Ring -- Yongbo
8) Tapers (polished to check the mode profile), two-level tapers -- Jock
