Difference between revisions of "Chips Table"
From OptoelectronicsWiki
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! Run ID !! wafer !! mask !! process flow !! process follower !! operator !! logbook !! results | ! Run ID !! wafer !! mask !! process flow !! process follower !! operator !! logbook !! results | ||
|- | |- | ||
− | | SOIBuffer2R 1 || || || || || || || | + | | SOIBuffer2R 1 || || || || || || || [[media:SOIBuffer2RBatch1.pptx | stuff]] |
|- | |- | ||
| SOIBuffer2R 2 || || || || || || || Grass during mesa etch. New batch started. | | SOIBuffer2R 2 || || || || || || || Grass during mesa etch. New batch started. |
Revision as of 09:47, 4 May 2010
Run ID | wafer | mask | process flow | process follower | operator | logbook | results |
---|---|---|---|---|---|---|---|
SOIBuffer2R 1 | stuff | ||||||
SOIBuffer2R 2 | Grass during mesa etch. New batch started. | ||||||
SOIBuffer2R 3 | Negative PR residue over III-V couldn't be cleaned off. Process follower adjusted. | ||||||
SOIBuffer2R 4 | Testing in progress | ||||||
#1727 W394 | Jared design | Lionix | 80-nm core | ||||
#1727 W395 | Jared design | Lionix | 80-nm core |