Chips Table

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Chip table
Run ID wafer mask process flow process follower operator logbook results
SOIBuffer2R 1             Summary of data.
SOIBuffer2R 2             Grass during mesa etch. New batch started.
SOIBuffer2R 3             Negative PR residue over III-V couldn't be cleaned off. Process follower adjusted.
SOIBuffer2R 4     Process follower       Testing in progress
#1727 W394 Jared design Lionix 80-nm core        
#1727 W395 Jared design Lionix 80-nm core